Gd2O3, Ga2O3(Gd2O3), Y2O3, and Ga2O3, as high-kgate dielectrics on SiGe: A comparative study
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1405134
Reference18 articles.
1. SiGe-channel heterojunction p-MOSFET's
2. Effects of Ge concentration on SiGe oxidation behavior
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4. Electrical characteristics of high quality La2O3 gate dielectric with equivalent oxide thickness of 5 /spl Aring/
5. MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics
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