Density relaxation of silicon dioxide on (100) silicon during thermal annealing
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345563
Reference23 articles.
1. General Relationship for the Thermal Oxidation of Silicon
2. Effect of oxidation-induced positive charges on the kinetics of silicon oxidation
3. Activation Energy for the Parabolic Rate Constant during Sequential Si Oxidation
4. Diffusion of Oxygen in Silicon Thermal Oxides
5. A Measurement of the Effect of Intrinsic Film Stress on the Overall Rate of Thermal Oxidation of Silicon
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