The role of the silyl radical in plasma deposition of microcrystalline silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1790577
Reference40 articles.
1. Chemical vapour deposition promoted by r.f. discharge
2. Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon
3. Deposition mechanism of hydrogenated amorphous silicon
4. Improvement of hydrogenated amorphous silicon properties with increasing contribution of SiH3 to film growth
5. Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma
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