Synchrotron‐radiation‐stimulated desorption of O+ions from an oxidized silicon surface
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102588
Reference5 articles.
1. UV ozone cleaning of silicon substrates in silicon molecular beam epitaxy
2. Low-Temperature Cleaning of HF-Passivated Si(111) Surface with VUV Light
3. Microscopic structure of theSiO2/Si interface
4. A photoelectron spectroscopy and photon stimulated desorption study of H2O on Si(100) 2×1
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3. Frenkel defect process in amorphous silica;SPIE Proceedings;2011-05-05
4. Direct observation of synchrotron-radiation-stimulated desorption of thin SiO2 films on Si(111) by scanning tunneling microscopy;Surface Science;1999-08
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