High-voltage mesa-structure GaN Schottky rectifiers processed by dry and wet etching

Author:

Zhu T. G.,Lambert D. J. H.,Shelton B. S.,Wong M. M.,Chowdhury U.,Dupuis R. D.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 60 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Polarization-Enhanced GaN Schottky Barrier Diodes: Ultra-Thin InGaN for High Breakdown Voltage and Low Ron;IEEE Electron Device Letters;2024-07

2. Design and fabrication of vertical GaN junction barrier Schottky rectifiers using Mg ion implantation;Japanese Journal of Applied Physics;2023-09-15

3. Simulation and Characterization Studies of GaN-Based Quasi-Vertical MIS SBD;2022 19th China International Forum on Solid State Lighting & 2022 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-02-07

4. Research progress in the postprocessing and application of GaN crystal;CrystEngComm;2023

5. Leakage Reduction of Quasi-Vertical GaN Schottky Barrier Diode With Post Oxygen Plasma Treatment;IEEE Transactions on Electron Devices;2022-12

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