5.5 kV Bipolar Diodes From High Quality CVD 411-SiC

Author:

Irvine K. G.,Singh R.,Paisley M. J.,Palmour J. W.,Kordina O.,Carter C. H.

Abstract

ABSTRACTThick, high quality 4H-SiC material suitable for high power devices has been grown in a hot-wall reactor. Recent improvements to the growth process have improved our thickness uniformity over a 50mm wafer to less than 1% and the doping uniformity to less than 5%, both values expressed as σ/mean.A record breaking reverse blocking voltage of 5.5 kV was obtained on P-i-N diodes fabricated from a 85μm thick film. The on-state voltage drop was 5.4 V at 100 A/cm2. From this on-state voltage drop, the carrier lifetime was estimated in excess of 1μs.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference6 articles.

1. Growth of SiC by ?Hot-Wall? CVD and HTCVD

2. Nitrogen doping concentration as determined by photoluminescence in 4H– and 6H–SiC

3. 4. Henry A. , Linköping University, Sweden (private communication).

4. 2. Kordina O. , Henry A. , Janzen E. , and Carter C.H. Jr. , Proceedings of the 7t' International Conference on Silicon Carbide, III-Nitrides and Related Materials, September 1997, Stockholm, Sweden, Part 1, p. 97, (Trans. Tech. Publications LTD 1998).

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