The thermally-induced reaction of thin Ni films with Si: Effect of the substrate orientation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3662110
Reference23 articles.
1. Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds
2. In situ real-time studies of nickel silicide phase formation
3. Kinetics of silicide formation measured by in situ ramped resistance measurements
4. Materials aspects, electrical performance, and scalability of Ni silicide towards sub-0.13 μm technologies
5. Metastable phase formation during the reaction of Ni films with Si(001): The role of texture inheritance
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