1. K. N. Tu and J. W. Mayer, inThin Films—Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978), Chap. 10.
2. M-A. Nicolet and S. S. Lau, inVLSI Electronics: Microstructure Science, edited by N. G. Einspruch and G. B. Larrabee (Academic, New York, 1983), Vol. 6, Chap. 6.
3. Kinetics of formation of silicides: A review
4. Kinetics of silicides on Si〈100〉 and evaporated silicon substrates
5. Insituresistivity measurement of cobalt silicide formation