Fluid simulation of species concentrations in capacitively coupled N2/Ar plasmas: Effect of gas proportion-Reference-Cited by-同舟云学术

Fluid simulation of species concentrations in capacitively coupled N2/Ar plasmas: Effect of gas proportion

Published:2017-05-28 Issue:20 Volume:121 Page:203302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Liang Ying-Shuang¹²,Liu Gang-Hu²,Xue Chan²,Liu Yong-Xin²^ORCID,Wang You-Nian²^ORCID

Affiliation:

1. School of Science, University of Science and Technology Liaoning, Anshan 114051, China

2. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian 116024, China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4983675

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1. Density and temperature of N atoms in the afterglow of a microwave discharge measured by a two-photon laser-induced fluorescence technique

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3. Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma

4. Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments

5. Low temperature plasma deposition of silicon nitride to produce ultra-reliable, high performance, low cost sealed chip-on-board (SCOB) assemblies

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