Interaction in the Cr/amorphous‐silicon system
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.358775
Reference11 articles.
1. Phase transformations in the Cr/a-Si system during low temperature annealing
2. Metal contact induced crystallization in films of amorphous silicon and germanium
3. Simultaneous occurrence of multiphases in the interfacial reactions of ultrahigh vacuum deposited Hf and Cr thin films on (111)Si
4. XPS analysis of thin chromium films
5. Contact reactions between amorphous silicon and single-crystal metallic films
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1. Growth of CrSi2 by radiation enhanced diffusion at room temperature;Journal of Applied Physics;2002-11
2. Comparison of amorphous Mo and Cr disilicides in hydrogenated amorphous silicon;Journal of Non-Crystalline Solids;2000-10
3. Room-temperature silicidation using radiation-enhanced diffusion in hydrogenated amorphous silicon;Applied Physics Letters;2000-02-07
4. Amorphous chromium silicide formation in hydrogenated amorphous silicon;Journal of Electronic Materials;1998-11
5. Time-of-flight and post-transit spectroscopy of a-Si1 − xCx:H alloys;Journal of Non-Crystalline Solids;1996-05
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