Amorphous chromium silicide formation in hydrogenated amorphous silicon-Reference-Cited by-同舟云学术

Amorphous chromium silicide formation in hydrogenated amorphous silicon

Published:1998-11 Issue:11 Volume:27 Page:1268-1271
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Kovsarian A.,Shannon J. M.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-998-0081-8.pdf

Reference19 articles.

1. A.H. Reader, A.H. van Ommen, P.J.W. Weijs, R.A.M. Wolters and D.J. Oostra, Rep. Prog. Phys. 56, 1397 (1992).

2. K. Maex and M.V. Rossum, Properties of Metal Silicides, INSPEC IEE London (1995).

3. N. Hirano, N. Ikeda, H. Yamaguchi, S. Nishida, Y. Hirai and S. Kaneko, Conference record of International Display Record Conference S.I.D. Monteray, 369 (1994).

4. M. Akiyama, Y. Ikeda, M. Ikeda and K. Suzuki, Society for Information Display 93 Digest 24, 887 (1993).

5. T. Tsukada, JARECT, Amorphous Semiconductor Technologies and Devices, ed. Y. Hamakawa, 22 (Ohmsha, Ltd and North-Holland, 1987), p. 157.

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