Atomic force nanolithography of InP for site control growth of InAs nanostructures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2430039
Reference12 articles.
1. Nanofabrication by scanning probe microscope lithography: A review
2. Application of atomic-force-microscope direct patterning to selective positioning of InAs quantum dots on GaAs
3. Growth process of quantum dots precisely controlled by an AFM-assisted technique
4. Site selective growth of Ge quantum dots on AFM-patterned Si substrates
5. InP patterning using contact mode and non-contact AFM lithography for quantum dot localization
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1. Investigation of the morphological and fractal behavior at nanoscale of patterning lines by scratching in an atomic force microscope;Microscopy Research and Technique;2021-11
2. Two-dimensional ordered growth of InAs nanowires assisted by randomly deposited silver nanoparticles on a topographically modified surface by a focused ion beam;Applied Surface Science;2019-11
3. Fabrication of Nanoscale Pits with High Throughput on Polymer Thin Film Using AFM Tip-Based Dynamic Plowing Lithography;Nanoscale Research Letters;2017-09-22
4. Study of growth properties of InAs islands on patterned InP substrates defined by focused ion beam;Physica E: Low-dimensional Systems and Nanostructures;2017-03
5. The effect of nanoscratching direction on the plastic deformation and surface morphology of InP crystals;Journal of Applied Physics;2013-11-28
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