Electron and ion energies in plasmas generated by the electron‐cyclotron‐resonance mechanism
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.871379
Reference22 articles.
1. High‐dose neutron generation from plasma ion implantation
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4. rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications
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Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHz;Review of Scientific Instruments;2000-02
2. Electron temperature, density, and metastable-atom density of argon electron–cyclotron-resonance plasma discharged by 7.0, 8.0, and 9.4 GHz microwaves;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000
3. Experimental investigation of a large volume magnetoplasma source based on surface-wave propagation;Plasma Sources Science and Technology;1998-05-01
4. Study on the ions’ behavior in an electron cyclotron resonance plasma;Journal of Applied Physics;1997-06-15
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