Model of plasma source ion implantation in planar, cylindrical, and spherical geometries
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345722
Reference15 articles.
1. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes
2. Plasma source ion implantation dose uniformity of a 2×2 array of spherical targets
3. The Effect of Space Charge and Initial Velocities on the Potential Distribution and Thermionic Current between Parallel Plane Electrodes
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