Effect of conventional and rapid thermal annealing on platinum silicide Schottky barrier diodes
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103055
Reference17 articles.
1. ISL, a fast and dense low-power logic, made in a standard Schottky process
2. A 3-ns 1-kbit RAM using super self-aligned process technology
3. A 4.5 ns access time 1K x 4 bit ECL RAM
4. PtSi contact metallurgy: Effect of silicide formation process
5. PtSi contact metallurgy formed by three‐temperature annealing sequences and short annealing time
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