Magnetron sputtering cathode for low power density operation-Reference-Cited by-同舟云学术

Magnetron sputtering cathode for low power density operation

Published:2017-12 Issue:12 Volume:7 Page:125225
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Motomura T.¹^ORCID,Tabaru T.¹^ORCID

Affiliation:

1. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology, 807-1 Shuku-machi, Tosu, Saga 841-0052, Japan

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5013341

Reference16 articles.

1. Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature

2. Thickness dependent physical and photocatalytic properties of ITO thin films prepared by reactive DC magnetron sputtering

3. Charged particle fluxes from planar magnetron sputtering sources

4. Sputtering systems with magnetically enhanced ionization for ion plating of TiN films

5. Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization

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