Germanium oxynitride gate interlayer dielectric formed on Ge(100) using decoupled plasma nitridation

Author:

Bhatt Piyush,Chaudhuri Krishnakali,Kothari Shraddha,Nainani Aneesh,Lodha Saurabh

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference17 articles.

1. R. Pillarisetty, B. Chu-Kung, S. Corcoran, G. Dewey, J. Kavalieros, H. Kennel, R. Kotlyar, V. Le, D. Lionberger, M. Metz, N. Mukherjee, J. Nah, W. Rachmady, M. Radosavljevic, U. Shah, S. Taft, H. Then, N. Zelick, and R. Chau, in IEEE Conference Proceedings of International Electron Devices Meeting (IEDM) (IEEE, New York, 2010), p. 150.

2. Fermi-level unpinning and low resistivity in contacts to n-type Ge with a thin ZnO interfacial layer

3. High-Performance $\hbox{GeO}_{2}/\hbox{Ge}$ nMOSFETs With Source/Drain Junctions Formed by Gas-Phase Doping

4. Evidence of low interface trap density in GeO2∕Ge metal-oxide-semiconductor structures fabricated by thermal oxidation

5. Ge Interface Passivation Techniques and Their Thermal Stability

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