Structural characterization of ion‐beam synthesized NiSi2layers-Reference-Cited by-同舟云学术

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Structural characterization of ion‐beam synthesized NiSi2layers

Published:1995-08 Issue:3 Volume:78 Page:1707-1712
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Wu M. F.,De Wachter J.,Van Bavel A.‐M.,Moons R.,Vantomme A.,Pattyn H.,Langouche G.,Bender H.,Vanhellemont J.,Temst K.,Bruynseraede Y.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.360268

Reference24 articles.

1. Epitaxial silicides

2. Epitaxial Silicides: a Summary of Recent Developments

3. Ion beam synthesis of epitaxial silicides: fabrication, characterization and applications

4. Mesotaxy: Single‐crystal growth of buried CoSi2layers

5. Strain and orientation in epitaxial CoSi2(111) layers formed by ion implantation

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1. Formation and crystallographic orientation of NiSi2–Si interfaces;Journal of Applied Physics;2020-08-28

2. The structure and magnetic properties in heavily Mn-doped MnxSi1−x films;Solid State Communications;2015-02

3. Structural and magnetic properties of Mn-implanted Si;Physical Review B;2007-02-07

4. Síntese e caracterização de nanocompósitos Ni: SiO2 processados na forma de filmes finos;Química Nova;2005-10

5. Optical and Magnetooptical Spectroscopy of the Nanostructural Multilayered Films: Possible Applications;Uspehi Fiziki Metallov;2005-06-01

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