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Epitaxial silicides

  • Published:1982-07 Issue:1-2 Volume:93 Page:77-90
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Tung R.T.,Poate J.M.,Bean J.C.,Gibson J.M.,Jacobson D.C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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3. Cobalt germanide contacts: growth reaction, phase formation models, and electrical properties;Journal of Materials Science: Materials in Electronics;2019-05-18

4. Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films;Diffusion Foundations;2019-03

5. Dislocations in Silicides;Mechanical Properties of Silicon Based Compounds: Silicides;2019
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