Amorphization and regrowth in Si/CoSi2/Si heterostructures

Author:

Maex Karen,White Alice E.,Short K. T.,Hsieh Yong‐Fen,Hull R.,Osenbach J. W.,Praefcke H. C.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Metal Silicides in CMOS Technology: Past, Present, and Future Trends;Critical Reviews in Solid State and Materials Sciences;2003-11

2. Ion‐Induced Amorphization and Regrowth of C49 and C54 TiSi2;Journal of The Electrochemical Society;1999-03-01

3. Topics in solid phase epitaxy: Strain, structure and geometry;Materials Science and Engineering: R: Reports;1996-01

4. Microstructural studies of epitaxial CoSi2layers on silicon produced by ion beam synthesis and rapid thermal annealing;Journal of Applied Physics;1993-12-15

5. Formation and characterization of epitaxial CoSi2 on Si(001);Applied Surface Science;1993-11

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