Scattering mechanisms in shallow undoped Si/SiGe quantum wells-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Scattering mechanisms in shallow undoped Si/SiGe quantum wells

Published:2015-10 Issue:10 Volume:5 Page:107106
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Laroche D.¹,Huang S.-H.²³,Nielsen E.¹,Chuang Y.²³,Li J.-Y.²³,Liu C. W.²³,Lu T. M.¹

Affiliation:

1. Sandia National Laboratories, Albuquerque, New Mexico 87185, USA

2. Department of Electrical Engineering and Graduate Institute of Electronic Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.

3. National Nano Device Laboratories, Hsinchu 30077, Taiwan, R.O.C.

Funder

Ministry of Science and Technology, Taiwan (MOST)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4933026

Reference41 articles.

1. Cooperative growth phenomena in silicon/germanium low‐temperature epitaxy

2. Extremely high electron mobility in Si/GexSi1−xstructures grown by molecular beam epitaxy

3. High-electron-mobility Si/SiGe heterostructures: influence of the relaxed SiGe buffer layer

4. Extremely high electron mobility in Si/SiGe modulation‐doped heterostructures

5. Strain-Induced Two-Dimensional Electron Gas in Selectively DopedSi/SixGe1−xSuperlattices

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of interface traps on charge noise and low-density transport properties in Ge/SiGe heterostructures;Communications Materials;2024-08-14

2. Local laser-induced solid-phase recrystallization of phosphorus-implanted Si/SiGe heterostructures for contacts below 4.2 K;Physical Review Materials;2024-04-12

3. Low disorder and high valley splitting in silicon;npj Quantum Information;2024-03-13

4. Understanding disorder in silicon quantum computing platforms: Scattering mechanisms in Si/SiGe quantum wells;Physical Review B;2024-03-04

5. Recent progress in undoped group-IV heterostructures for quantum technologies;Materials for Quantum Technology;2024-02-26

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3