Electrical characteristics of thin Ta2O5 films deposited by reactive pulsed direct-current magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.372033
Reference21 articles.
1. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
2. Selective Studies of Crystalline Ta2 O 5 Films
3. Electrical Characteristics of the RF Magnetron‐Sputtered Tantalum Pentoxide‐Silicon Interface
4. Structures and properties of a Ta2O5 thin film deposited by dc magnetron reactive sputtering in a pure O2 atmosphere
5. Structures of tantalum pentoxide thin films formed by reactive sputtering of Ta metal
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