Analysis of pulsed high-density HBr and Cl2 plasmas: Impact of the pulsing parameters on the radical densities
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3663443
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1. Poly-Si∕TiN∕HfO[sub 2] gate stack etching in high-density plasmas
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5. Characteristics of large-diameter plasma using a radial-line slot antenna
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