Role of sulfur atoms in microwave plasma etching of silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339652
Reference20 articles.
1. Tungsten Etching in CF 4 and SF 6 Discharges
2. SF 6, a Preferable Etchant for Plasma Etching Silicon
3. Profile Control of Polysilicon Lines with an SF 4 / O 2 Plasma Etch Process
4. Computer simulation of a CF4plasma etching silicon
5. Surface processes in plasma-assisted etching environments
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