Computer simulation of a CF4plasma etching silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.334108
Reference29 articles.
1. The design of plasma etchants
2. Computer Simulation in Chemical Kinetics
3. The plasma oxidation of CF4in a tubular‐alumina fast‐flow reactor
4. Low Energy Ion Beam Etching
5. Investigation of plasma etching mechanisms using beams of reactive gas ions
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