Characterization of the plasma in a radio-frequency magnetron sputtering system
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1728295
Reference19 articles.
1. Magnetron sputtering of films with controlled texture and grain size
2. Plasma nitriding enhanced by hollow cathode discharge – a new method for formation of superhard nanocomposite coatings on steel surfaces
3. The abnormal structure of nanocrystalline titanium films prepared by d.c. sputtering
4. The structure of Cu-Al films prepared by unbalanced DC magnetron sputtering
5. Plasma chemistry model of DC magnetron reactive sputtering in Ar O2 gas mixtures
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