Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition-Reference-Cited by-同舟云学术

Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Published:2021-01-09 Issue:1 Volume:11 Page:148
ISSN:2079-4991
Container-title:Nanomaterials
language:en
Short-container-title:Nanomaterials

Author:

Palmero Alberto^ORCID,Alcala German^ORCID,Alvarez Rafael^ORCID

Abstract

The scientific interest in the growth of nanostructured surfaces and thin films by means of physical vapor deposition (PVD) techniques has undoubtedly increased in the last decade [...]

Funder

Consejería de Economía, Innovación, Ciencia y Empleo, Junta de Andalucía

Comunidad de Madrid

Universidad de Sevilla

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

Link

https://www.mdpi.com/2079-4991/11/1/148/pdf

Reference22 articles.

1. Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

2. On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar–O2 mixtures: theoretical and experimental approach

3. Reactive Sputter Deposition,2008

4. Characterization of the plasma in a radio-frequency magnetron sputtering system

5. Growth of nanocolumnar porous TiO 2 thin films by magnetron sputtering using particle collimators

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