Band-to-band tunneling in Γ valley for Ge source lateral tunnel field effect transistor: Thickness scaling

Author:

Jain Prateek1,Rastogi Priyank1,Yadav Chandan1,Agarwal Amit2ORCID,Chauhan Yogesh Singh1ORCID

Affiliation:

1. Department of Electrical Engineering, Indian Institute of Technology Kanpur, Kanpur, Uttar Pradesh 208016, India

2. Department of Physics, Indian Institute of Technology Kanpur, Kanpur, Uttar Pradesh 208016, India

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference41 articles.

1. Tunnel field-effect transistors as energy-efficient electronic switches

2. Impact Ionization MOS (I-MOS)—Part I: Device and Circuit Simulations

3. M. Zhu , S. S. Tan et al., “ Method of fabricating a silicon tunneling field effect transistor (TFET) with high drive current,” U.S. patent 12,587,511 (June 14 2011).

4. Band Engineering to Improve Average Subthreshold Swing by Suppressing Low Electric Field Band-to-Band Tunneling With Epitaxial Tunnel Layer Tunnel FET Structure

5. J. Knoch , in International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) (2009), pp. 45–46.

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