Direct reaction of gas-phase atomic hydrogen with chemisorbed chlorine atoms on a silicon surface
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.476457
Reference76 articles.
1. Dynamics of adsorption/desorption at solid surfaces
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3. Interaction of atomic hydrogen with the surface methyl group on Si(100) — removal of surface carbon
4. First-principles-derived dynamics of a surface reaction: Fluorine etching of Si(100)
5. Influence of Si surface structure on reaction mechanism: Atomic hydrogen+adsorbed Br
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3. Interaction of Gas-phase Atomic Hydrogen with Chemisorbed Oxygen Atoms on a Silicon Surface;Bulletin of the Korean Chemical Society;2011-05-20
4. Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-03
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