Atomic layer etching of InP using a low angle forward reflected Ne neutral beam
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2221504
Reference7 articles.
1. Preferential sputtering of InP: an AES investigation
2. InP Etching Using Chemically Assisted Ion Beam Etching ( Cl2 / Ar ) Formation of InCl x Clusters under High Concentration of Chlorine
3. Epitaxial growth on InP substrates etched with methane reactive ion etching technique
4. Realization of atomic layer etching of silicon
5. Development of a low angle forward reflected neutral oxygen beam for materials processing
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