Al diffusivity as a function of growth rate during the formation of (GaAl)As heterojunctions by liquid phase epitaxy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.328768
Reference14 articles.
1. Isothermal LPE growth of thin graded band‐gap AlxGa1−xAs layers
2. Growth and properties of graded band‐gap AlxGa1−xAs layers
3. Growth and dissolution kinetics of III-V heterostructures formed by LPE
4. Growth and dissolution kinetics of III‐V heterostructures formed by LPE. II. Comparison between thermodynamic and kinetic models
5. The formation of Ga1−xAlxAs layers on the surface of GaAs during continual dissolution into Ga‐Al‐As solutions
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2. Time and temperature influence over graded band‐gap AlxGa1−xAs layers;Journal of Applied Physics;1991-06
3. Single and multiple AlGaAs quantum‐well structures grown by liquid‐phase epitaxy;Journal of Applied Physics;1990-09
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