Anatomy of μc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1287129
Reference41 articles.
1. Ellipsometry investigation of nucleation and growth of electron cyclotron resonance plasma deposited silicon films
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3. Polycrystalline silicon film growth in a SiF4/SiH4/H2 plasma
4. In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition
5. Growth mechanism of microcrystalline silicon obtained from reactive plasmas
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