The effects of argon and helium dilution in the growth of nc-Si:H thin films by plasma-enhanced chemical vapor deposition
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/article/10.1007/s10853-017-1791-1/fulltext.html
Reference48 articles.
1. Shah AV, Meier J, Buechel A, Kroll U, Stenhauser J, Meillaud F, Shade H, Domine D (2006) Towards very low-cost mass production of thin-film silicon photovoltaic (PV) solar modules on glass. Thin Solid Films 502:292–299
2. Orpella A, Voz C, Puigodollers J, Dosev D, Fonrodona M, Soler D, Bertomeu J, Asensi JM, Andreu J, Alcubila R (2001) Stability of hydrogenated nanocrystalline silicon thin-film transistors. Thin Solid Films 395:335–338
3. Chowdhury A, Mukhopadhyay S, Ray S (2008) Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties. Sol Energy Mater Sol Cells 92:385–392
4. Meir J, Fluckiger R, Kepprer H, Shah A (1994) Complete microcrystalline p-i-n solar cell—crystalline or amorphous cell behavior. Appl Phys Lett 65:860–862
5. Staebler DL, Wronski CR (1977) Reversible conductivity changes in discharge-produced amorphous Si. Appl Phys Lett 31:292–294
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fabrication of highly conductive phosphorous-doped nc-SiCx:H thin film on PET;Physica Scripta;2024-01-05
2. Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition;Vacuum;2021-07
3. Anomalous hopping in hydrogenated amorphous silicon doped with phosphine;Journal of Non-Crystalline Solids;2021-07
4. Growth of crystalline silicon by a seed layer approach using plasma enhanced chemical vapor deposition;Physica B: Condensed Matter;2021-05
5. Complex Dielectric Characteristics, ac-Conductivity, and Impedance Spectroscopy of B-Doped nc-SiOX:H Thin Films;ACS Applied Electronic Materials;2021-04-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3