Hydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4864255
Reference31 articles.
1. Electrically tunable white-color electroluminescence from Si-implanted silicon nitride thin film
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3. Dual dielectric tunnel barrier in silicon-rich silicon nitride charge-trap nonvolatile memory
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5. Reducing quantum-regime dielectric loss of silicon nitride for superconducting quantum circuits
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1. From Jekyll to Hyde and Beyond: Hydrogen’s Multifaceted Role in Passivation, H-Induced Breakdown, and Charging of Amorphous Silicon Nitride;The Journal of Physical Chemistry Letters;2024-01-18
2. A Study of Temperature‐Dependent Photoluminescence from As‐Deposited and Heavy‐Ion‐Irradiated Plasma‐Enhanced Chemical Vapor Deposition‐Grown Si‐Rich a ‐SiN x :H Thin Films;physica status solidi (b);2019-12-17
3. Film materials based on a-SiNx:H with high refractive index obtained by plasma enhanced chemical vapour deposition technology;Thin Solid Films;2019-01
4. Hydrogen loss and its improved retention in hydrogen plasma treated a-SiN :H films: ERDA study with 100 MeV Ag7+ ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2018-05
5. Evolution of a dense interlayer in a-SiNx:H thin films under 100 MeV Ni7+ ion irradiation;AIP Conference Proceedings;2017
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