Fabrication and characterization of reactive ion beam etched SiC gratings
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1143037
Reference13 articles.
1. SiC mirror development at the Photon Factory (invited)
2. Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment
3. Reactive Ion-Beam Etching of Silicon Carbide
4. Plasma Etching of CVD Grown Cubic SiC Single Crystals
5. Dry etching of β‐SiC in CF4 and CF4+O2 mixtures
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2. Unidirectional thermal radiation from a SiC metasurface;Journal of the Optical Society of America B;2017-12-06
3. Fabrication of high-efficiency and low-stray-light grating by inductively coupled plasma(ICP) etching-polishing method;Optics Express;2016-03-09
4. Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-x-ray flat-field spectrograph in the region of 17 keV;Applied Optics;2007-09-27
5. Frontiers in High- Resolution X- Ray Diagnostics of Plasmas 6.Frontiers in X-Ray Optical Components for High-Resolution Spectroscopy and Imaging 6.1Laminar Type Varied-Line-Spacing Holographic Gratings for Soft X-Ray;Journal of Plasma and Fusion Research;2003
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