Dry etching of β‐SiC in CF4 and CF4+O2 mixtures-Reference-Cited by-同舟云学术

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Dry etching of β‐SiC in CF4 and CF4+O2 mixtures

Published:1986-05 Issue:3 Volume:4 Page:590-593
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Palmour J. W.,Davis R. F.,Wallett T. M.,Bhasin K. B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.573854

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