Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment
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Published:1983
Issue:4
Volume:1
Page:927
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Winters Harold F.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
60 articles.
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