Electrical characteristics and conduction mechanisms of metal-insulator-metal capacitors with nanolaminated Al2O3–HfO2 dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2969399
Reference15 articles.
1. Characterization of Laminated CeO[sub 2]–HfO[sub 2] High-k Gate Dielectrics Grown by Pulsed Laser Deposition
2. Characteristics of Al/sub 2/O/sub 3//TiO/sub 2/ nanolaminates and AlTiO thin films on Si
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