Spontaneous Generation of a Molecular Thin Hydrophobic Skin Layer on a Sub-20 nm, High-k Polymer Dielectric for Extremely Stable Organic Thin-Film Transistor Operation-Reference-Cited by-同舟云学术

Spontaneous Generation of a Molecular Thin Hydrophobic Skin Layer on a Sub-20 nm, High-k Polymer Dielectric for Extremely Stable Organic Thin-Film Transistor Operation

Published:2019-07-23 Issue:32 Volume:11 Page:29113-29123
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Choi Junhwan¹,Yoon Jongsun²,Kim Min Ju³,Pak Kwanyong¹,Lee Changhyeon¹,Lee Haechang³,Jeong Kihoon¹,Ihm Kyuwook⁴,Yoo Seunghyup³,Cho Byung Jin³,Lee Hyomin²^ORCID,Im Sung Gap¹^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering and KI for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

2. Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang, Gyeongbuk 37673, Republic of Korea

3. School of Electrical Engineering and KI for NanoCentury at Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

4. Nano & Interface Research Team, Pohang Accelerator Laboratory, Pohang, Gyeongbuk 37673, Republic of Korea

Funder

Samsung Research Funding Center of Samsung Electronics

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.9b09891

Reference62 articles.

1. Organic thin-film transistors

2. An ultra-lightweight design for imperceptible plastic electronics