Coupling effects in inductive discharges with radio frequency substrate biasing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3675879
Reference26 articles.
1. Principles of Plasma Discharges and Materials Processing
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5. Secondary electrons in dual-frequency capacitive radio frequency discharges
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