A comparison of surface roughness as measured by atomic force microscopy and x-ray scattering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.366129
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1. Dependence of thin-oxide films quality on surface microroughness
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3. Roughness of the silicon (001)/SiO2interface
4. Rapid thermal oxidation of silicon in N2O between 800 and 1200 °C: Incorporated nitrogen and interfacial roughness
5. Growth temperature dependence of the Si(001)/SiO2interface width
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