Sheath and potential characteristics in rf magnetron sputtering plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2360384
Reference37 articles.
1. Properties of rf‐sputtered Al2O3 films deposited by planar magnetron
2. Planar magnetron sputtering
3. Preparation and properties of Al2O3 films by d.c. and r.f. magnetron sputtering
4. Plasma production with DC discharge planar magnetron device for thin film preparation
5. The influence of the discharge power on film composition obtained by reactive magnetron sputtering
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