The influence of the discharge power on film composition obtained by reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference8 articles.
1. The use of nitrogen flow as a deposition rate control in reactive sputtering
2. The characteristics of a planar magnetron operated at a high power input
3. Structure and composition of hydrogenated TixCy thin films prepared by reactive sputtering
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Argon–oxygen dc magnetron discharge plasma probed with ion acoustic waves;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-05
2. Effects of N2 content and thickness on CrNx coatings on Mg alloy by the planar DC reactive magnetron sputtering;Applied Surface Science;2009-04
3. Investigation of theE×Brotation of electrons and related plasma characteristics in a radio frequency magnetron sputtering discharge;Journal of Physics D: Applied Physics;2007-11-02
4. Effect of oxygen on the characteristics of radio frequency planar magnetron sputtering plasma used for aluminum oxide deposition;Journal of Applied Physics;2007-04-15
5. Sheath and potential characteristics in rf magnetron sputtering plasma;Journal of Applied Physics;2006-10-15
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