Preparation and properties of Al2O3 films by d.c. and r.f. magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Direct current reactive sputtering of aluminium
2. Reactive film preparation
3. Oxidation of an aluminum magnetron sputtering target in Ar/O2mixtures
4. Surface oxidation kinetics of sputtering targets
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