Development and plasma characterization of an 850 MHz surface-wave plasma source-Reference-Cited by-同舟云学术

Development and plasma characterization of an 850 MHz surface-wave plasma source

Published:2017-10 Issue:10 Volume:7 Page:105213
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Sahu B. B.¹,Koga S.²,Toyoda H.²,Han Jeon G.¹

Affiliation:

1. NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technology (CAPST), Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea

2. Department of Electrical Engineering and Computer Science, Plasma Nanotechnology Research Center, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

Funder

Korea Institute for Advancement of Technology

Ministry of Science, ICT and Future Planning

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4995442

Reference72 articles.

1. Fabrication of ultrathin Ni–Zn ferrite films using electron cyclotron resonance sputtering method

2. Development and studies on a compact electron cyclotron resonance plasma source