A Linear Microwave Plasma Source Using a Circular Waveguide Filled with a Relatively High-Permittivity Dielectric: Comparison with a Conventional Quasi-Coaxial Line Waveguide

Abstract

For a conventional linear microwave plasma source (LMPS) with a quasi-coaxial line transverse electromagnetic (TEM) waveguide, a linearly extended plasma is sustained by the surface wave outside the tube. Due to the characteristics of the quasi-coaxial line MPS, it is easy to generate a uniform plasma with radially omnidirectional surfaces, but it is difficult to maximize the electron density in a curved selected region. For the purpose of concentrating the plasma density in the deposition area, a novel LMPS which is suitable for curved structure deposition has been developed and compared with the conventional LMPS. As the shape of a circular waveguide, it is filled with relatively high-permittivity dielectric instead of a quasi-coaxial line waveguide. Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical-slotted line antenna, and the radiated electric field in the radial direction is made almost parallel to the tangential plane of the window surface. This research includes the advanced 3D numerical analysis and compares the results with the experiment. It shows that the electron density in the deposition area is higher than that of the conventional quasi-coaxial line plasma MPS.