Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference19 articles.
1. Sixteen years GaN on Si;Dadgar;Phys. Status Solidi Basic Res.,2015
2. A review of gallium nitride LEDs for multi-gigabit-per-second visible light data communications;Rajbhandari;Semicond. Sci. Technol.,2017
3. III-nitrides: Growth, characterization, and properties;Jain;J. Appl. Phys.,2000
4. GaN-on-Silicon - present capabilities and future directions;Boles;AIP Conf. Proc.,2018
5. Theoretical study of GaN growth: a Monte Carlo approach;Wang;J. Appl. Phys.,1994
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