Elementary surface processes during reactive magnetron sputtering of chromium
Author:
Affiliation:
1. Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum, Germany
Funder
Deutsche Forschungsgemeinschaft (DFG)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4932150
Reference19 articles.
1. Magnetron sputtering – Milestones of 30 years
2. Modeling of reactive sputtering of compound materials
3. Fundamental understanding and modeling of reactive sputtering processes
4. Ion-enhanced oxidation of aluminum as a fundamental surface process during target poisoning in reactive magnetron sputtering
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