Magnetron sputtering – Milestones of 30 years-Reference-Cited by-同舟云学术

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Magnetron sputtering – Milestones of 30 years

Published:2010-06 Issue:12 Volume:84 Page:1354-1359
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Bräuer G.,Szyszka B.,Vergöhl M.,Bandorf R.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference14 articles.

1. A highest rate self-sputtering magnetron source

2. Krug T, Beißwenger S, Kukla R. 34th Annual Technical Conference Proceedings of the Society of Vacuum Coaters; 1991. pp. 183–188.

3. Advances in magnetron sputter sources

4. Adam R, Krempel-Hesse J, Bähr M. Sputter cathode, US Patent 6,139,706; 2000.

5. McKelvey HE. Magnetron cathode sputtering apparatus, US patent 4,356,073; 1982.

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