Validation of etching model of polypropylene layers exposed to argon plasmas-Reference-Cited by-同舟云学术

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Validation of etching model of polypropylene layers exposed to argon plasmas

Published:2019-03-29 Issue:6 Volume:16 Page:1900019
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Corbella Carles¹^ORCID,Pranda Adam²,Portal Sabine³,los Arcos Teresa⁴,Grundmeier Guido⁴,Oehrlein Gottlieb S.²,Keudell Achim¹^ORCID

Affiliation:

1. Institute for Experimental Physics II Ruhr‐University Bochum Bochum Germany

2. Department of Materials Science and Engineering University of Maryland College Park Maryland

3. Department of Applied Solid State Physics Ruhr‐University Bochum Bochum Germany

4. Technical and Macromolecular Chemistry Paderborn University Paderborn Germany

Funder

Deutsche Forschungsgemeinschaft

National Science Foundation

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.201900019

Reference21 articles.

1. The Plasma Chemistry of Polymer Surfaces

2. White paper on the future of plasma science and technology in plastics and textiles

3. In situ spectroellipsometry study of the crosslinking of polypropylene by an argon plasma

4. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

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1. PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth;Plasma Processes and Polymers;2023-10-30

2. Thickness of the Modified Polymer Layer Formed by Low-Temperature Plasma Treatment;High Energy Chemistry;2023-09-29

3. Thickness of the Modified Polymer Layer Formed by Low-Temperature Plasma Treatment;Химия высоких энергий;2023-09-01

4. High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐ b ‐PMMA Block Copolymer Nanomasks during Mask Development;Advanced Materials Interfaces;2022-08-17

5. Ion incidence angle dependent pattern formation at AZ 4562® photo resist by Ar+ ion beam erosion;Applied Surface Science;2022-02

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